![]() ![]() 230000001052 transient Effects 0.000 claims abstract description 4.238000004590 computer program Methods 0.000 claims abstract description 4.238000010894 electron beam technology Methods 0.000 claims abstract description 29. ![]() 238000001914 filtration Methods 0.000 claims abstract description 34.238000004627 transmission electron microscopy Methods 0.000 claims abstract description 56.238000001493 electron microscopy Methods 0.000 title claims abstract description 20.230000004075 alteration Effects 0.000 title claims abstract description 125.Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.) Filing date Publication date Priority claimed from EP17210806.0 external-priority Application filed by Fei Company filed Critical Fei Company Priority to US17/253,097 priority Critical patent/US11587759B2/en Publication of WO2019133433A1 publication Critical patent/WO2019133433A1/en Links Inventor Maarten Bischoff Peter Christiaan Tiemeijer Tjerk Gerrit Spanjer Stan Johan Pieter Konings Original Assignee Fei Company Priority date (The priority date is an assumption and is not a legal conclusion. Google Patents WO2019133433A1 - Method, device and system for reducing off-axial aberration in electron microscopy ![]() WO2019133433A1 - Method, device and system for reducing off-axial aberration in electron microscopy ![]()
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